Amorphous carbon thin films: Mechanisms of hydrogen incorporation during magnetron sputtering and consequences for the secondary electron emission
نویسندگان
چکیده
Amorphous carbon (a-C) films, having low secondary electron yield (SEY), are used at CERN to suppress multipacting in the beam pipes of particle accelerators. It was already demonstrated that hydrogen impurities increase SEY a-C films. In this work, a systematic characterization set coatings, deliberately contaminated by deuterium during magnetron sputtering deposition, scanning microscopy, ion analysis, mass spectrometry, and optical absorption spectroscopy performed establish correlation between content emission properties. parallel, mechanisms contamination were also investigated. Adding allows resolving contributions intentional natural contamination. The results enabled us quantify relative deuterium/hydrogen (D/H) amounts relate them with maximum (SEYmax). first step incorporation appears be formation D/H atoms discharge. An both flux deposited discharge current D2 fraction gas can explained target poisoning species followed etching CxDy clusters, mainly physical sputtering. For overall 11% 47% gas, SEYmax increases almost linearly from 0.99 1.38. abrupt growth 1.38 2.12 takes place narrow range 47%–54%, for which nature films changes polymer-like layer.
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ژورنال
عنوان ژورنال: Journal of vacuum science & technology
سال: 2023
ISSN: ['2327-9877', '0734-211X']
DOI: https://doi.org/10.1116/6.0002759